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13 May 1994 Spectral effects on x-ray lithography
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The actinic spectra of two beamlines of the University of Wisconsin's Center for X-ray Lithography (CXrL) at the Aladdin storage ring were studied in three configurations. Some beamlines optimized for particular bandwidths are presented and their impact on mask making, aerial image quality, printed image quality, and device damage discussed. Resist performance dependence on the actinic spectrum is investigated. The exposure-gap tree response of 0.25 micron features is presented for different spectra. Resist characteristic curve data were collected for these conditions and are compared.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Whitson G. Waldo, Azalia A. Krasnoperova, Mumit Khan, Cristiano Capasso, James Welch Taylor, and Franco Cerrina "Spectral effects on x-ray lithography", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994);

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