Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents

Vladimir N. Genkin; M. Yu. Myl'nikov

doi:10.1117/12.175387

16 May 1994 Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents

Vladimir N. Genkin, M. Yu. Myl'nikov

Author Affiliations +

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175387
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The development processes in microlithography consist in removing of exposure region with rate V exceeding the dissolution rate of unexposed regions. The technology characteristics of the resists are the contrast, the sensitivity and the resolution. These characteristics depend on the resist response to the irritation and on the development conditions. We want to devote this work to the analysis of correlation between the resolution, the contrast, the sensitivity determined by the indicated method and the exposure dose for homogeneous irradiation.

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Vladimir N. Genkin and M. Yu. Myl'nikov "Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175387

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