16 May 1994 Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents
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Abstract
The development processes in microlithography consist in removing of exposure region with rate V exceeding the dissolution rate of unexposed regions. The technology characteristics of the resists are the contrast, the sensitivity and the resolution. These characteristics depend on the resist response to the irritation and on the development conditions. We want to devote this work to the analysis of correlation between the resolution, the contrast, the sensitivity determined by the indicated method and the exposure dose for homogeneous irradiation.
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Vladimir N. Genkin, M. Yu. Myl'nikov, "Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175387; https://doi.org/10.1117/12.175387
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KEYWORDS
Polymers

Macromolecules

Diffusion

Molecules

Solids

Thermodynamics

Optical lithography

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