Evaluation of a bilayer resist system based on a zirconium-containing polymer

Ferdinand Rodriguez; Ashwin S. Ramachandran

doi:10.1117/12.175362

16 May 1994 Evaluation of a bilayer resist system based on a zirconium-containing polymer

Ferdinand Rodriguez, Ashwin S. Ramachandran

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175362
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In the present work, the bilayer system investigated was comprised of a negative working portable conformable mask (PCM) and an underlying planarizing layer. The lithographic evaluation of the PCM as a stand-alone single-layer resist (SLR) was presented in an earlier paper. The DPEPA acts as a sensitizer to e-beam radiation by enhancing exposure-induced crosslinking. The presence of Zr in the form of an organometallic in the PCM results in the formation of an oxide-based barrier to etch in oxygen and CF₄/0₂ plasmas. The PCM in the bilayer system was found to have improved contrast (approximately 0.7-3.0) relative to the SLR, though it was also less sensitive (sensitivity in the range of 1.5-15 (mu) C/cm²). Features of 0.5 micron were delineable with this resist scheme, using acetic acid as a developer. Increasing the DPEPA improved sensitivity but resulted in a deterioration of contrast. The bilayer resist etch rates during RIE were studied in a parallel plate etcher as a function of power density, chamber pressure, etchant gas flow rate and mole% CF₄ in the plasma. For the system described here and under identical etching conditions, the bilayer etched 1/12 as fast as pure PMMA in oxygen and at 80 nm/min (versus 214 nm/min for PMMA) in a 92:8 CF₄/0₂ plasma. The presence of the PCM afforded the PMMA resist more RIE time, the upper limit of etch duration increasing with increased planarizer thickness. Post-etch scanning electron micrographs indicate that the imaged stencils are dimensionally stable to prolonged etches in these environments.

Citation Download Citation

Ferdinand Rodriguez and Ashwin S. Ramachandran "Evaluation of a bilayer resist system based on a zirconium-containing polymer", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175362

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