16 May 1994 Evaluation results for the positive deep-UV resist AZ DX 46
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Abstract
This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D, as exposure source, delivered by Cymer Laser Technologies. As far as delay time experiments are concerned ASM-L PAS 5500/70 stepper, NA equals 0.42, was used in combination with Lambda Physik excimer laser, model 248 L.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Walter Spiess, Thomas J. Lynch, Charles Le Cornec, Gary C. Escher, Yoshiaki Kinoshita, John Kochan, Takanori Kudo, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Setha G. Olson, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Klaus Juergen Przybilla, Horst Roeschert, Natusmi Suehiro, Francoise Vinet, Horst Wengenroth, "Evaluation results for the positive deep-UV resist AZ DX 46", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175402; https://doi.org/10.1117/12.175402
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