16 May 1994 Evaluation results for the positive deep-UV resist AZ DX 46
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Abstract
This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D, as exposure source, delivered by Cymer Laser Technologies. As far as delay time experiments are concerned ASM-L PAS 5500/70 stepper, NA equals 0.42, was used in combination with Lambda Physik excimer laser, model 248 L.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Walter Spiess, Walter Spiess, Thomas J. Lynch, Thomas J. Lynch, Charles Le Cornec, Charles Le Cornec, Gary C. Escher, Gary C. Escher, Yoshiaki Kinoshita, Yoshiaki Kinoshita, John Kochan, John Kochan, Takanori Kudo, Takanori Kudo, Seiya Masuda, Seiya Masuda, Thierry Mourier, Thierry Mourier, Yuko Nozaki, Yuko Nozaki, Setha G. Olson, Setha G. Olson, Hiroshi Okazaki, Hiroshi Okazaki, Munirathna Padmanaban, Munirathna Padmanaban, Georg Pawlowski, Georg Pawlowski, Klaus Juergen Przybilla, Klaus Juergen Przybilla, Horst Roeschert, Horst Roeschert, Natusmi Suehiro, Natusmi Suehiro, Francoise Vinet, Francoise Vinet, Horst Wengenroth, Horst Wengenroth, } "Evaluation results for the positive deep-UV resist AZ DX 46", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175402; https://doi.org/10.1117/12.175402
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