16 May 1994 Influence of retained and absorbed solvent on novolak- and resist- film dissolution and thermal behavior
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Abstract
Solvent evaporation from Novolak solution was characterized by TGA and occurs in two distinct stages of solvent loss: an evaporation limiting state (solvent determined) and a diffusion limiting stage (polymer determined) and is used to understand solvent retention mechanism during spin coating. Retained solvent content in Novolak films, as determined by gas chromatography and FT-IR Spectrometry, is found to reduce the apparent Tg and increase the bulk dissolution rate of the novolak. Solvent distribution in the film, monitored as a function of depth by a reflectance FT-IR technique, is used to develop a Novolak dissolution model which characterizes both surface induction and bulk dissolution behavior.
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Bernard T. Beauchemin, Bernard T. Beauchemin, Charles E. Ebersole, Charles E. Ebersole, Ivan S. Daraktchiev, Ivan S. Daraktchiev, } "Influence of retained and absorbed solvent on novolak- and resist- film dissolution and thermal behavior", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175374; https://doi.org/10.1117/12.175374
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