Molecular bases for the interaction between novolaks and diazonaphthoquinone photoactive compounds

Marie Borzo; Joseph J. Rafalko; Ralph R. Dammel

doi:10.1117/12.175380

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16 May 1994 Molecular bases for the interaction between novolaks and diazonaphthoquinone photoactive compounds

Marie Borzo, Joseph J. Rafalko, Ralph R. Dammel

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Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175380
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

An investigation of the molecular characteristics of DNQ-PACs both in isolation and in combination with polymer matrices using the techniques of solid state magic angle sample spinning Fourier transform (FT) nuclear magnetic resonance (NMR) spectroscopy and FT-Raman spectroscopy has been initiated. These investigations necessitated a rather fundamental look at the spectroscopic signatures of DNQ's in various environments. Two dimensional NMR techniques have been used to unambiguously assign carbon-13 and proton NMR spectra of the 2,1,5-DNQ moiety in solution. The nitrogen-15 NMR spectrum of 2,1,5-DNQ has also been assigned. While preliminary solid state NMR and FT-Raman spectra have demonstrated that these techniques can be used to monitor the effect of matrices on DNQ/PACs at the molecular level, isotopic labelling will be required to fully understand the nature of the interactions. The correlation of molecular-based information with macroscopic resist performance should lead to the development of new improved resists.

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Marie Borzo, Joseph J. Rafalko, and Ralph R. Dammel "Molecular bases for the interaction between novolaks and diazonaphthoquinone photoactive compounds", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175380

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