16 May 1994 Synthesis and patterning of 2 to 10-nm pinhole-free organic films
Author Affiliations +
Abstract
Ultrathin films in the thickness range of 2-10 nm were deposited by plasma polymerization. An AFM (atomic force microscope) was used to evaluate the film surface uniformity. The measured surface roughness of these films is of the order of 0.1 to 0.3 nm. It suggests that uniformly smooth, pinhole free ultra thin film organic films suitable for electronic applications can be deposited by plasma polymerization. The deposited films were tested for nanometer scale patterning using an atomic force microscope. Process of contact electrification was used to deposit local electric charge on these surface enhanced reactions with some adsorbates thus creating patterns.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sucheta Gorwadkar, G. K. Vinogradov, K. Senda, Ryoichi Inanami, C. Shao, Shinzo Morita, "Synthesis and patterning of 2 to 10-nm pinhole-free organic films", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175397; https://doi.org/10.1117/12.175397
PROCEEDINGS
9 PAGES


SHARE
KEYWORDS
Atomic force microscopy

Thin films

Plasma

Optical lithography

Polymerization

Silicon

Polymer thin films

Back to Top