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1 May 1994 Comprehensive detection of defects on reduction reticles
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Abstract
As understanding of the effects of defects on reduction reticles advances, the desire for automatic detection of all classes of defects is created. The comprehensive detection of defects on reduction reticles is the ability to detect and classify defects that have not previously been associated with the defect inspection task. Test reticles have been fabricated with defects of these types and used to characterize inspection systems. Inspection characterization results show that a modified inspection system using simultaneous transmitted and reflected light inspection allows the detection of contamination on chrome and glass surfaces. Using an unmodified inspection system with standard defect detection algorithms, critical dimension errors due to e-beam lithography system butting errors were detected for errors smaller than 0.20 micrometers . Using an enhanced defect detection algorithm, transmission errors greater than -10% on contact geometry were detected.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James N. Wiley "Comprehensive detection of defects on reduction reticles", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174152
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