Development of a deep-UV Mirau correlation microscope

Fang Cheng Chang; Gordon S. Kino; William K. Studenmund

doi:10.1117/12.174156

1 May 1994 Development of a deep-UV Mirau correlation microscope

Fang Cheng Chang, Gordon S. Kino, William K. Studenmund

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174156
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Progress is being made on the development of a deep UV interferometric microscope to operate at a wavelength of 248 nm. The eventual aim is to make measurements of 0.18 - 0.25 micrometers gate structures. The microscope employs a mercury vapor light source, an image intensifier with a CCD or vidicon camera, and quartz lenses. The device is based on the Mirau correlation microscope, and uses a Mirau interferometer with a new type of radially sectored beamsplitter. Feasibility has been demonstrated.

Citation Download Citation

Fang Cheng Chang, Gordon S. Kino, and William K. Studenmund "Development of a deep-UV Mirau correlation microscope", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174156

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