1 May 1994 Photochemical batches: E0 modelling and applications
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Experimental investigations into long term process variability at Digital's FAB4 facility indicated batch to batch changes in photochemicals were a significant contributor to process variation. The individual resist and developer batches themselves were within photospeed specifications: however, certain combinations of the two chemicals occasionally resulted in an out of spec condition. A study was undertaken to investigate this phenomenon. The work commenced with an extensive photospeed measurement capability study between the supplier and Digital. Upon completion of the capability work a statistically designed experiment was defined to investigate `system' photospeed. The experiment involved examining the resultant photospeed for all possible combinations of five individual resist and developer batches. Each resist and developer batch was manufactured to a unique photospeed target with values selected to cover and exceed the current photospeed specifications for each of the individual chemicals. The experimental results led to the development of a photochemical batch EO model which defined resultant photospeed as a function of the individual resist/developer batch photospeeds.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James S. Lekas, James S. Lekas, James C. Pew, James C. Pew, Mark A. Wirzbicki, Mark A. Wirzbicki, } "Photochemical batches: E0 modelling and applications", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174143; https://doi.org/10.1117/12.174143


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