Deep-UV photolithography cluster performance

Noreen Harned

doi:10.1117/12.175487

17 May 1994 Deep-UV photolithography cluster performance

Noreen Harned

Author Affiliations +

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175487
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

As minimum feature size has decreased, and design rules have tightened, successful deep UV 0.35 micron technology has required a photolithography cluster. Linkage of the lithography exposure tool with the critical apply and develop process is driven by the need to improve cycle time, minimize defects, and optimize image tolerances. This paper summarizes results from Micrascan II photo clusters, and discusses the directions in which photo clusters must continue to evolve in order to satisfy the needs for 0.35 micron, and succeeding generations, of imaging technology.

Citation Download Citation

Noreen Harned "Deep-UV photolithography cluster performance", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175487

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