High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography

Alexander N. Novoselov; Boris A. Konstantinov; Victor G. Nikiforov; Boris F. Trinchuk

doi:10.1117/12.175484

17 May 1994 High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography

Alexander N. Novoselov, Boris A. Konstantinov, Victor G. Nikiforov, Boris F. Trinchuk

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175484
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

First time the possibility to use unstable telescopic resonator with Fabry-Perot etalon as a selective spectral element in excimer KrF laser to reduce the beam divergence and narrow linewidth of laser radiation is demonstrated. The efficiency of the new resonator was demonstrated on serial laser 9J114-'94, and radiation with the following parameters was received — output energy 20 mJ, spectrum width 15 pm, energy divergence less or equal O.18x0.30 mrad. The spectral brightness of the laser radiation was increased more than for order of value in comparison with the use of a conventional selective flat resonator, and achieved 2.5 * io J/cm2 * sr * nm. Further improvement of laser characteristics due to optimization of proposed optical resonator scheme parameters is possible.

Citation Download Citation

Alexander N. Novoselov, Boris A. Konstantinov, Victor G. Nikiforov, and Boris F. Trinchuk "High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175484

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