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17 May 1994 Optimization of optical properties for single-layer halftone masks
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Abstract
An algorithm necessary to decide the optimum optical properties of a single-layer halftone (HT) mask has been established. This paper reveals the relations between the refractive index n and the extinction coefficient k, and thickness d, and describes how to select optimum films among various materials. It has been found that SiNx is a good material for a single-layer HT mask for I-line (365 nm) and KrF (248 nm). The lithographic performance of an I-line SiNx HT mask for grouped line and space (L&S) patterns under annular illumination has also been demonstrated.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinichi Ito, Hiroaki Hazama, Takashi Kamo, Hideya Miyazaki, Hiroyuki Sato, Kenji Hayashi, Fumiaki Shigemitsu, and Ichiro Mori "Optimization of optical properties for single-layer halftone masks", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175486
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