Programming of phase-shift mask simulation software and some important aspects

Long Que; Guoliang Sun; Feng Boru

doi:10.1117/12.175445

17 May 1994 Programming of phase-shift mask simulation software and some important aspects

Long Que, Guoliang Sun, Feng Boru

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175445
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In the paper we report some work on the programming of phase shift mask (PSM) simulation software, some important parameters are analyzed, in the meantime, we set up the mathematical models for studying rounding characteristics of imaging of the bar patterns under the project lithography system with incoherent, partial coherent, coherent illumination, and theoretical results compared to the experimental results.

Citation Download Citation

Long Que, Guoliang Sun, and Feng Boru "Programming of phase-shift mask simulation software and some important aspects", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175445

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