17 May 1994 Quantitative stepper metrology using the focus monitor test mask
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Abstract
A new lithographic test pattern, the focus monitor, is introduced. Through the use of phase shift techniques, focus errors translate into easily measurable overlay shifts in the printed pattern. Each individual focus monitor pattern can be directly read for the sign and magnitude of the focus error. This paper presents a detailed verification of the validity of this approach, along with several preliminary applications.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy A. Brunner, Alexander Lee Martin, Ronald M. Martino, Christopher P. Ausschnitt, Thomas H. Newman, Michael S. Hibbs, "Quantitative stepper metrology using the focus monitor test mask", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175449; https://doi.org/10.1117/12.175449
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