Recent advances of a KrF excimer laser on a plant's practical requirements

Yukio Kobayashi; Takanobu Ishihara; Hiroaki Nakarai; Noritoshi Ito; Tomokazu Takahashi; Osamu Wakabayashi; Hakaru Mizoguchi; Yoshiho Amada; Junichi Fujimoto; Masahiko Kowaka; Yasuhiro Nozue

doi:10.1117/12.175482

17 May 1994 Recent advances of a KrF excimer laser on a plant's practical requirements

Yukio Kobayashi, Takanobu Ishihara, Hiroaki Nakarai, Noritoshi Ito, Tomokazu Takahashi, Osamu Wakabayashi, Hakaru Mizoguchi, Yoshiho Amada, Junichi Fujimoto, Masahiko Kowaka, Yasuhiro Nozue

Author Affiliations +

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175482
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In this paper we describe the performance of the newest model of line-narrowed KrF excimer laser KLES-G6 (1995 model) developed in factory on the practical requirements. The KLES- G6 exhibits: (1) spectral bandwidth < 0.8 pm; (2) wavelength stability < +/- 0.1 pm; (3) pulse-to-pulse energy stability < 1.8% ((sigma) ); (4) output power equals 6 W at 600 Hz; (5) gas life > 100 million pulses or 7 days; (6) window cleaning or exchange > 1 billion pulses; (7) laser chamber exchange > 2 billion pulses; (8) mean time between failures > 1500 hours; (9) running cost per a billion pulses is about 29 thousand dollars. These advanced performances will save the running cost and guarantee the high uptime ratio needed to satisfy the plant's practical requirements.

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Yukio Kobayashi, Takanobu Ishihara, Hiroaki Nakarai, Noritoshi Ito, Tomokazu Takahashi, Osamu Wakabayashi, Hakaru Mizoguchi, Yoshiho Amada, Junichi Fujimoto, Masahiko Kowaka, and Yasuhiro Nozue "Recent advances of a KrF excimer laser on a plant's practical requirements", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175482

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