17 May 1994 Scattered light in photolithographic lenses
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Abstract
Scattered light, flare, is present in the images formed by all photolithography lenses and it reduces lithographic process tolerances. It varies from lens to lens and with time, but is easily measured by observation of images of opaque objects formed in positive photoresist. The scattered light halo of a lens is modeled and the model used to estimate the flare for any reticle used with that lens.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph P. Kirk, "Scattered light in photolithographic lenses", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175451; https://doi.org/10.1117/12.175451
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