Translator Disclaimer
17 May 1994 Techniques for improving overlay on multilayer phase-shift masks
Author Affiliations +
Techniques used to optimize the alignment performance of the CORE-2564PSM reticle writer are presented. In particular, unique procedures for accurately locating alignment marks with nonuniform background intensities are discussed. Site-by-site automatic illumination control is implemented to ensure optimal image intensity and contrast for the CCD-based image capture system. Process and metrology considerations that affect error measurement are discussed. The mean + range/2 aligned overlay of the CORE-2564PSM is shown to be 35 - 55 nm.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henry Chris Hamaker, Michael J. Bohan, Peter D. Buck, Claudia H. Geller, Takashi Makiyama, Francis P. Mathew, and William S. Neeland "Techniques for improving overlay on multilayer phase-shift masks", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994);

Back to Top