7 September 1994 Surface processing by high-power soft x-ray irradiation
Author Affiliations +
Proceedings Volume 2207, Laser Materials Processing: Industrial and Microelectronics Applications; (1994) https://doi.org/10.1117/12.184708
Event: Europto High Power Lasers and Laser Applications V, 1994, Vienna, Austria
Abstract
The principle of high power soft X-ray source design using laser plasma and waveguide X-ray optics is described. The radiation parameters of pulse and high-repetitive sources are reported. The experiments on X-ray induced effect on crystalline heteroepitaxial ZnSe/GaAs films are described.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valery Ju. Znamenskiy, O. B. Anan'in, J. Bykovsky, Ju. V. Eremin, I. K. Novikov, A. A. Zhuravlev, "Surface processing by high-power soft x-ray irradiation", Proc. SPIE 2207, Laser Materials Processing: Industrial and Microelectronics Applications, (7 September 1994); doi: 10.1117/12.184708; https://doi.org/10.1117/12.184708
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Debris-free soft x-ray source with gas-puff target
Proceedings of SPIE (December 06 2001)
Low timing jitter pulsed hard x ray photography by laser...
Proceedings of SPIE (November 14 2001)
Femtosecond x-ray diagnostic
Proceedings of SPIE (November 14 2003)
Time-resolved experiments using laser-plasma x-ray sources
Proceedings of SPIE (December 01 1998)

Back to Top