7 September 1994 Surface processing by high-power soft x-ray irradiation
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Proceedings Volume 2207, Laser Materials Processing: Industrial and Microelectronics Applications; (1994) https://doi.org/10.1117/12.184708
Event: Europto High Power Lasers and Laser Applications V, 1994, Vienna, Austria
Abstract
The principle of high power soft X-ray source design using laser plasma and waveguide X-ray optics is described. The radiation parameters of pulse and high-repetitive sources are reported. The experiments on X-ray induced effect on crystalline heteroepitaxial ZnSe/GaAs films are described.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valery Ju. Znamenskiy, Valery Ju. Znamenskiy, O. B. Anan'in, O. B. Anan'in, J. Bykovsky, J. Bykovsky, Ju. V. Eremin, Ju. V. Eremin, I. K. Novikov, I. K. Novikov, A. A. Zhuravlev, A. A. Zhuravlev, } "Surface processing by high-power soft x-ray irradiation", Proc. SPIE 2207, Laser Materials Processing: Industrial and Microelectronics Applications, (7 September 1994); doi: 10.1117/12.184708; https://doi.org/10.1117/12.184708
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