30 September 1994 Improved method for contamination control during fabrication of space equipment
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A direct method for quantitatively controlling organic as well as inorganic contamination on optical surfaces of witness plates of only 1 cm2 is suggested. Measurements by X-ray Photoelectron Spectroscopy (XPS) quantified by appropriate software give the quantity and chemical composition of contamination on any interesting surface with a typical detection limit of better than 10-9 gcm-2. Results regarding the contamination growth on different optical materials and coatings under atmospheric conditions are presented. The contamination strongly depends on the chemical and structural properties of the surfaces. Therefore, reliable contamination control has to be done by sensitive measurements on either the surfaces of interest or on similarly treated resp. coated witness plates. To utilize the high sensitivity of the XPS-method, the witness plates have to be prepared and handled very carefully. Appropriate procedures for the contamination control of sensible optical surfaces as well as for the general control of clean rooms and fabrication facilities are described.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Weissbrodt, Peter Weissbrodt, L. Raupach, L. Raupach, Erich J. Hacker, Erich J. Hacker, } "Improved method for contamination control during fabrication of space equipment", Proc. SPIE 2210, Space Optics 1994: Space Instrumentation and Spacecraft Optics, (30 September 1994); doi: 10.1117/12.188127; https://doi.org/10.1117/12.188127

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