Translator Disclaimer
Paper
28 July 1994 Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam
Author Affiliations +
Abstract
Groove patterns with submicron lateral sizes and depths of several hundreds of nanometers have been defined in silica glass surfaces by focused ion beam implantation and differential wet etching in hydrofluoric acid solutions. Nonperiodic arbitrary patterns can be defined and variable depth achieved through local ion dose control. The fabrication of diffractive optical elements for excimer lasers in the ultraviolet is described.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jacques Albert, Bernard Malo, Francois Bilodeau, Derwyn C. Johnson, Kenneth O. Hill, Ian M. Templeton, and John L. Brebner "Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180949
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
Back to Top