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28 July 1994 Postprocessing of nm-period multilayer structures
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We study effects of macro- and micro-postprocessing of multilayered synthetic Ni/C film structures. The structures have nm-period 1D modulation of concentration of the major components. Initially low surface and interface roughness of such structures makes them advantageous for application as a new type of substrates in nanofabrication technologies and for information storage with nm-resolution. Metastability of microstructure and high residual stresses favor the use of the structures themselves as a media for fine-scale processing.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. A. Gorbunov, Wolfgang Pompe, Reiner Dietsch, Hermann Mai, Michael Panzner, Rhena Krawietz, and B. Wehner "Postprocessing of nm-period multilayer structures", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994);

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