28 July 1994 Transfer of submicron period gratings by conventional chromium mask photolithography
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Abstract
Conventional chromium mask transfer can be used for the photolithographic transfer of high spatial frequency gratings at nonnormal incidence. A systematic study brings the tolerance on the transfer parameters such as proximity, angle of incidence, and line/space ratio.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henry Vuilliomenet, Henry Vuilliomenet, Lucien G. Falco, Lucien G. Falco, Olivier M. Parriaux, Olivier M. Parriaux, Michel Neviere, Michel Neviere, } "Transfer of submicron period gratings by conventional chromium mask photolithography", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180959; https://doi.org/10.1117/12.180959
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