Principles of the integrated optical noninvasive inspections (or nondestructive testing) of material quality are considered. It's well known that different optical methods allow us to obtain 2-dimensional spatial distributions of parameters most required for tested materials. The aim of this contribution is to elaborate ways of comprehensively using optical techniques (photometry, reflectivity, scattering, interferometry, holography, polarization, luminescence and so on). The special feature of proposed set up is the modular construction and high flexibility in design, i.e., it is possible to adapt our equipment to different kinds of automated testing techniques. Considered methods and set up were applied to the investigation of a wide range of subjects, e.g., solid natural or artificial materials, liquid crystals, microporous or fractal matrix, solutions, and biological specimens. In this paper only the results, concerned with semiconductor wafers or film-structures, are discussed. The experimental verifications and arbitrary electrophysical measurements are included.