15 November 1994 Comprehensive optical diagnostics of IR-sensitive film structures
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Proceedings Volume 2248, Optical Measurements and Sensors for the Process Industries; (1994) https://doi.org/10.1117/12.194355
Event: Optics for Productivity in Manufacturing, 1994, Frankfurt, Germany
Abstract
Principles of the integrated optical noninvasive inspections (or nondestructive testing) of material quality are considered. It's well known that different optical methods allow us to obtain 2-dimensional spatial distributions of parameters most required for tested materials. The aim of this contribution is to elaborate ways of comprehensively using optical techniques (photometry, reflectivity, scattering, interferometry, holography, polarization, luminescence and so on). The special feature of proposed set up is the modular construction and high flexibility in design, i.e., it is possible to adapt our equipment to different kinds of automated testing techniques. Considered methods and set up were applied to the investigation of a wide range of subjects, e.g., solid natural or artificial materials, liquid crystals, microporous or fractal matrix, solutions, and biological specimens. In this paper only the results, concerned with semiconductor wafers or film-structures, are discussed. The experimental verifications and arbitrary electrophysical measurements are included.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey C. Stafeev, Sergey C. Stafeev, } "Comprehensive optical diagnostics of IR-sensitive film structures", Proc. SPIE 2248, Optical Measurements and Sensors for the Process Industries, (15 November 1994); doi: 10.1117/12.194355; https://doi.org/10.1117/12.194355
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