15 November 1994 Knowledge-based monitoring and control of plasma processes using chromaticity measurements
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Proceedings Volume 2248, Optical Measurements and Sensors for the Process Industries; (1994) https://doi.org/10.1117/12.194332
Event: Optics for Productivity in Manufacturing, 1994, Frankfurt, Germany
Abstract
Chromatic monitoring techniques have been developed to provide rapid feedback on the state of electrically induced plasmas. These techniques have been used to provide diagnostic information, based on the plasma emissions, and also to give rapid feedback on the thickness of insulating films while being processed. It is also possible that the chromatic technique could be used to monitor other important aspects of plasma systems, such as the concentration of particulates in plasmas and substrate temperature. The chromatic monitors provide information to a knowledge based system, which also has access to data from the conventional gas flow, pressure and rf power meters. The knowledge base consists of a set of rules, obtained by interviewing processing experts, and a statistical model of the plasma chamber. As well as being able to diagnose coarse errors in the plasma chamber equipment, the knowledge based system can compensate for undesirable variations during process runs.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul C. Russell, Paul C. Russell, Gordon R. Jones, Gordon R. Jones, P. Baker, P. Baker, P. Huggett, P. Huggett, D. Alston, D. Alston, Richard V. Smith, Richard V. Smith, } "Knowledge-based monitoring and control of plasma processes using chromaticity measurements", Proc. SPIE 2248, Optical Measurements and Sensors for the Process Industries, (15 November 1994); doi: 10.1117/12.194332; https://doi.org/10.1117/12.194332
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