4 November 1994 Composite films prepared by plasma ion-assisted deposition (IAD) for design and fabrication of antireflection coatings in visible and near-infrared spectral regions
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192167
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Ion-assisted deposition (IAD) processes configured with a well-controlled plasma source at the center base of a vacuum chamber, which accommodates two independent e-gun sources, is used to deposition TiO2MgF2 and TiO2-SiO2 composite films of selected component ratios. Films prepared by this technology are found durable, uniform, and nonabsorbing in visible and near-IR regions. Single- and multilayer antireflection coatings with refractive index from 1.38 to 2.36 at (lambda) equals 550 nm are presented. Methods of enhancement in optical performance of these coatings are studied. The advantages of AR coatings formed by TiO2-MgF2 composite films over those similar systems consisting of TiO2-SiO2 composite films in both visible and near-IR regions are also presented.
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Rung-Ywan Tsai, Rung-Ywan Tsai, Fang Chung Ho, Fang Chung Ho, } "Composite films prepared by plasma ion-assisted deposition (IAD) for design and fabrication of antireflection coatings in visible and near-infrared spectral regions", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192167; https://doi.org/10.1117/12.192167
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