Deposition of metal/dielectric multilayer filters

Brian Thomas Sullivan; Jerzy A. Dobrowolski

doi:10.1117/12.192062

4 November 1994 Deposition of metal/dielectric multilayer filters

Brian Thomas Sullivan, Jerzy A. Dobrowolski

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192062
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

The successful manufacture of metal/dielectric multilayer systems requires not only very close control of the thicknesses of the individual layers, but also a good knowledge of the optical constants of the materials they are made of. In the case of metal films, it is also essential to know whether any transition layers are formed at the interfaces and, if so, how their thicknesses and optical constants depend on the deposition conditions. Numerical modeling of the metal layers and their interfaces is a powerful tool for the determination of these parameters. To illustrate the method, a bandpass filer and a long-wavelength cut-off filter, both having a low reflectance for light incident on one side, were produced. Excellent agreement has been obtained between the calculated and the measured spectral transmittance and reflectance curves.

Citation Download Citation

Brian Thomas Sullivan and Jerzy A. Dobrowolski "Deposition of metal/dielectric multilayer filters", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192062

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KEYWORDS

Reflectivity

Multilayers

Metals

Interfaces

Transmittance

Plasma

Silver

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