4 November 1994 Direct optical monitoring instrument with a double detection system for the control of multilayer systems from the visible to the near infrared
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192114
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
An instrument for direct optical monitoring of film grown during deposition was developed. The transmittances of the original substrates, rotating for homogeneity reasons, are measured. The instrument is equipped with a double detection system including a linear photodiode array and a photomultiplier tube, working at different variable wavelengths. The design of the instrument, the main features and first produced optical devices are described.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Markus Tilsch, Markus Tilsch, Volker Scheuer, Volker Scheuer, Josef Staub, Josef Staub, Theo T. Tschudi, Theo T. Tschudi, } "Direct optical monitoring instrument with a double detection system for the control of multilayer systems from the visible to the near infrared", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192114; https://doi.org/10.1117/12.192114
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