Fabrication, structure, optical properties, and stability of W-Si multilayer x-ray reflectors

Hans-Joachim Kuehn; J. Kraeusslich

doi:10.1117/12.192084

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4 November 1994 Fabrication, structure, optical properties, and stability of W-Si multilayer x-ray reflectors

Hans-Joachim Kuehn; J. Kraeusslich

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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192084
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

Multilayer reflectors are necessary for spectroscopic and imaging systems, working with soft X-rays ((lambda) equals 1..20 nm), for instance for X-ray lithography, microscopy and holography. We have tested a simple method for deposition of multilayer X-ray reflectors by dc-plasmatron sputtering. W-Si multilayers with up to 80 layer pairs, prepared by this method, were characterized by X-ray reflection, AES, RBS, SNMS and AFM. Optical constants, individual layer thicknesses (1..3 nm) and interface roughness were determined by fit of the X-ray reflection curves.

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Hans-Joachim Kuehn and J. Kraeusslich "Fabrication, structure, optical properties, and stability of W-Si multilayer x-ray reflectors", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192084

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