4 November 1994 In situ optical multichannel spectrometer system
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192115
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
We have realized an in-situ multichannel spectrometer system for on line optical thin film controlling during deposition. The system is working as a thin film optical monitor as well as an universal process control system. The measurements are made on the original optics during rotation, to avoid tooling factor errors and to take advantage of error compensation of successive layers. The typical thickness accuracy is 0.25% of the design wavelength.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harry H. Bauer, Harry H. Bauer, Erwin Nuessler, Erwin Nuessler, } "In situ optical multichannel spectrometer system", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192115; https://doi.org/10.1117/12.192115
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