4 November 1994 Ion-beam-assisted deposition of thermally evaporated Cr thin films
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192133
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Optical, electrical, and microstructural properties of thermally evaporated Cr thin films assisted by the low-energy Ar ion beam were investigated. The result shows that the optical and electrical properties are close to those of the corresponding bulk Cr: both refractive index and extinction coefficient increase, reflectance increases, and electrical resistivity decreases. The tensile stress decreases while the grain size changes slightly. From this experimental study, it is found that the low-energy Ar ion beam bombardment on growing Cr films modifies the microstructure of Cr films to improve the optical and electrical properties.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chang Kwon Hwangbo, Kwang-Lim Yoo, Hyun-Ju Cho, "Ion-beam-assisted deposition of thermally evaporated Cr thin films", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192133; https://doi.org/10.1117/12.192133
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