4 November 1994 Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy
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Proceedings Volume 2253, Optical Interference Coatings; (1994); doi: 10.1117/12.192158
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
We have studied the changes of dielectric optical coatings after laser conditioning using atomic force microscopy (AFM). Laser conditioning is the process which consists of illuminating a film by a laser below damage threshold in order to increase this threshold value. This method is implemented for optics used in high fluence laser beam such as Nd-glass lasers (1064 nm, 3 ns pulse length). We have studied e-beam evaporation deposited highly reflective multilayer ZrO2/SiO2 mirrors, and also single layers of SiO2, HfO2 and ZrO2. We have observed the modification of the surface after laser conditioning using the AFM. We find that this process results in localized minimization or elimination of defects (nodules, craters, etc...). Furthermore, the origin of the increase in the size of the hillocks observed after laser conditioning and previously reported by other groups, has been experimentally identified as an instrumental artifact.
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Anne Fornier, C. Cordillot, Dominique Ausserre, F. Paris, "Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192158; https://doi.org/10.1117/12.192158
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KEYWORDS
Atomic force microscopy

Optical coatings

Laser damage threshold

Laser optics

Mirrors

Multilayers

Dielectrics

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