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4 November 1994 Multilayer coatings for x-ray optics made by distributed electron cyclotron resonance (DECR) plasma sputtering
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Proceedings Volume 2253, Optical Interference Coatings; (1994)
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Distributed electron cyclotron resonance (DECR) plasma sputtering was used for depositing W/Si multilayers for x-rya optics. The argon plasma used in the sputtering process was excited by the DECR method. The DECR argon plasma diffusing the middle of the deposition chamber was characterized with a Langmuir probe. The ionization rate was found to be 7 X 10-4. This allowed us to sputter W and Si with a large range of target bias values at low pressures. Deposited single layers and W/Si multilayers were characterized with grazing incidence x-ray reflectometry. As an illustration of the capabilities, data is shown for a W/Si multilayer with period d equals 3.0 nm and an interface roughness (sigma) < 0.47 nm.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Hoghoj, Eric Ziegler, Eike Lueken, Jean-Christophe Peffen, and Andreas K. Freund "Multilayer coatings for x-ray optics made by distributed electron cyclotron resonance (DECR) plasma sputtering", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994);


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