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4 November 1994 Optical-electric thin films produced by low-voltage reactive plasma assisted deposition
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192171
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Low voltage reactive plasma assisted deposition (RPAD) is used here, to deposit the optical- electric films, such as transparent conductive thin films and Si3N4 films. Comparing to other thermal evaporation techniques, RPAD can produce more easily such kind of opto- electric thin films. Experimental results of the films deposited will be presented in this paper.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xu Liu, Bin Wang, Peifu Gu, and Jinfa Tang "Optical-electric thin films produced by low-voltage reactive plasma assisted deposition", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192171
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