4 November 1994 Properties of rf magnetron-sputtered C and C:N thin films
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192091
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
A series of nitrogenated and nitrogen-free carbon films was prepared under various deposition conditions (substrate temperatures between 40 - 535 degree(s)C and working gas pressures between 0.09 - 5.0 Pa). Rutherford backscattering, Raman scattering, surface profilometry, ellipsometry, hardness and adhesion measurements were performed and results were related to both nitrogen and oxygen content in the layers.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jaroslav Sobota, Jaroslav Sobota, Jiri Hrdina, Jiri Hrdina, Vladimir Vorlicek, Vladimir Vorlicek, Ivan Gregora, Ivan Gregora, Petr Siroky, Petr Siroky, Vratislav Perina, Vratislav Perina, } "Properties of rf magnetron-sputtered C and C:N thin films", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192091; https://doi.org/10.1117/12.192091

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