4 November 1994 Properties of rf magnetron-sputtered C and C:N thin films
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192091
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
A series of nitrogenated and nitrogen-free carbon films was prepared under various deposition conditions (substrate temperatures between 40 - 535 degree(s)C and working gas pressures between 0.09 - 5.0 Pa). Rutherford backscattering, Raman scattering, surface profilometry, ellipsometry, hardness and adhesion measurements were performed and results were related to both nitrogen and oxygen content in the layers.
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Jaroslav Sobota, Jiri Hrdina, Vladimir Vorlicek, Ivan Gregora, Petr Siroky, Vratislav Perina, "Properties of rf magnetron-sputtered C and C:N thin films", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192091; https://doi.org/10.1117/12.192091
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