Pulsed-laser deposition of x-ray optical layer stacks with atomically flat interfaces

Hermann Mai; Reiner Dietsch; Thomas Holz; S. Voellmar; S. Hopfe; Roland Scholz; Peter Weissbrodt; Rhena Krawietz; B. Wehner; H. Eichler; H. Wendrock

doi:10.1117/12.192079

4 November 1994 Pulsed laser deposition of x-ray optical layer stacks with atomically flat interfaces

Hermann Mai, Reiner Dietsch, Thomas Holz, S. Voellmar, S. Hopfe, Roland Scholz, Peter Weissbrodt, Rhena Krawietz, B. Wehner, H. Eichler, H. Wendrock

Author Affiliations +

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192079
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

Pulsed laser deposition is described as a technique for the synthesis of multilayers showing X- ray optical quality. The state of the art is characterized by results that demonstrate a development of the instrument basis superior to that of conventional PLD systems. Multilayers of the Ni/C, Mo/Si- and W/C-types prove the versatility of the method and the output of layer stack characterization by HREM, SPM, XD, AES, XPS, ellipsometry and image processing ensures a high quality with regard to stack regularity, layer homogeneity and interface smoothness.

Citation Download Citation

Hermann Mai, Reiner Dietsch, Thomas Holz, S. Voellmar, S. Hopfe, Roland Scholz, Peter Weissbrodt, Rhena Krawietz, B. Wehner, H. Eichler, and H. Wendrock "Pulsed laser deposition of x-ray optical layer stacks with atomically flat interfaces", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192079

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