4 November 1994 Single and multilayer coatings deposited by laser-assisted electron beam evaporation
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192126
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Laser assisted electron beam evaporation is a new deposition technique to improve the microstructure of HfO2 and Y2O3 films for optical applications. Major advantages of this method are an increased refractive index, a higher laser damage threshold at 248 nm and reduced absorption compared with films deposited by electron beam evaporation. It is possible to influence the refractive index changing by the laser power and to prepare multilayer like systems containing only one coating material.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dieter Schaefer, Dieter Schaefer, Peter Thomsen-Schmidt, Peter Thomsen-Schmidt, H. Johansen, H. Johansen, T. Martini, T. Martini, Bernhard Steiger, Bernhard Steiger, G. Pfeifer, G. Pfeifer, Guenter Reisse, Guenter Reisse, } "Single and multilayer coatings deposited by laser-assisted electron beam evaporation", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192126; https://doi.org/10.1117/12.192126
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