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3 November 1994 Analysis of mask distortion induced by heating during e-beam writing
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Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994)
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
The 3D heat diffusion equation was numerically solved to determine the e-beam writing induced local and global heating and the corresponding distortion for optical and x-ray masks. The beam was 50 kV with maximum current I equals 4 (mu) A for optical masks, and I equals 0.3 (mu) A for x-ray masks. Calculations indicate that the distortion due to the localized temperature rise is negligible for both types of masks. The global distortion for optical masks is on the order of 0.04 micrometers (for I equals 4 (mu) A), and on the order of 0.007 micrometers for x-ray masks (for I equals 0.3 (mu) A) for a dose of 10 (mu) C/cm2 under dense-pattern mask writing conditions.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alberto Moel and Yoshio Gomei "Analysis of mask distortion induced by heating during e-beam writing", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191931;

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