Application of conventional defect repair technique to phase-shifting masks

Katsuhiro Takushima; Hideyuki Jinbo; Taro Saito; Itsuji Ashida; Yoshio Tanaka

doi:10.1117/12.191950

3 November 1994 Application of conventional defect repair technique to phase-shifting masks

Katsuhiro Takushima; Hideyuki Jinbo; Taro Saito; Itsuji Ashida; Yoshio Tanaka

Author Affiliations +

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191950
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

We studied phase shifter defect repair techniques which use conventional mask repair tools. This paper describes two repair techniques applicable to phase shifter residue defects on the etch-stop layer of a quartz substrate. These new techniques, which use a conventional Nd:YAG laser and a Focused Ion Beam (FIB) are beam-on-edge and absorber implantation. Beam-on-edge repair removes phase shifter pin-dots by optimally applying an Nd:YAG laser under conventional mask repair conditions. Absorber implantation repair optimizes phase shifter form combining FIB and Nd:YAG laser tools.

Citation Download Citation

Katsuhiro Takushima, Katsuhiro Takushima, Hideyuki Jinbo, Hideyuki Jinbo, Taro Saito, Taro Saito, Itsuji Ashida, Itsuji Ashida, Yoshio Tanaka, Yoshio Tanaka, } "Application of conventional defect repair technique to phase-shifting masks", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191950; https://doi.org/10.1117/12.191950

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