3 November 1994 Evolution of pellicles
Author Affiliations +
Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191952
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
Along with the higher integration of LSI, an implementation of Pellicle as a dust proof on Mask is much more required. Under steady technological developments, such as shorter wave length KrF Excirner laser or Deep UV, Pellicle auto—mounter, and particle detector, the requirements for Pellicle are changing and becoming much more severe. Therefore, we would like to introduce the current pellicle status and the future emphases regarding three main aspects; particle, light transmission, and light resistance, respectively here under.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naofumi Inoue, Naofumi Inoue, Hiroaki Nakagawa, Hiroaki Nakagawa, Masahiro Kondou, Masahiro Kondou, "Evolution of pellicles", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191952; https://doi.org/10.1117/12.191952


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