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3 November 1994 Focused ion beams for x-ray mask repair
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Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191926
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
Abstract
To ensure production of functional devices based on X-ray lithography, the masks must be defect free. We have developed a repair process integrated with a focused ion beam (FIB) system such that proximity print X-ray masks with features as small as 0.25 micrometers can be repaired to industry specifications. Inspection data is transferred to the tool, and defects on masks are repaired using this data. We will review the primary technical concerns associated with repair of X-ray masks, and we will discuss design elements of the FIB system which are vital to machine performance. Examples of the inspection-repair cycle will be shown. Finally, we address the ability of the tool to place repairs accurately and reproducibly so that manufacturing specifications can be achieved on proximity print X-ray masks.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diane K. Stewart, Thomas K. Olson, and Andrew F. Doyle "Focused ion beams for x-ray mask repair", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191926
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