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3 November 1994 Large-area optical design rule checker for logic PSM application
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Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994)
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
An aerial optical design rule checker (ODRC) that will handle large areas is used to validate the automatic CAD software used for application of alternating Phase Shift Mask technology to logic devices. An automatic alternating aperture layout algorithm developed internally by Advanced Micro Devices is applied to 0.24 to 0.50 micrometers electrical designs. The layout is then verified for different stepper and defocus values by the ODRC which utilizes the simulated aerial image to compare directly to the electrical design database. Entire databases are handled by fracturing the database into optically isolated areas or by using a sliding window technique. Small areas up to 420 um per side can be done with single processor workstations with at least 512 megabyte of memory. Larger problems require multiprocessor computers with at least 16 gigabyte of memory. Full circuit analysis should be done on systems with at least 64 gigabyte of memory in order to accomplish solving the problem in a reasonable time frame.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John L. Nistler, Chris A. Spence, Eytan Barouch, and Uwe Hollerbach "Large-area optical design rule checker for logic PSM application", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994);

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