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3 November 1994 Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance
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Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994)
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
Half-tone phase shift masks with Cr-based shifters have been developed for i-line lithography. The printability of defects is determined with test marks for the four categories of defects: clear defects (pinholes and intrusions) and opaque defects (pinspots and extrusions) under the conditions that a normal hole of 0.40-micrometers width is formed by an i-line stepper with NA equals 0.57. The detectability with a KLA219HRL-PS and that of a KLA331 are also evaluated. The minimum detectable defect size is found to be smaller than the minimum intolerable defect size for each category. Clear defects are repairable by covering them with carbon patches deposited by a focused-ion-beam repair system. On the basis of the consideration of both the shielding effect and the halo effect of the patch, the deposition conditions are optimized: the thickness is 150 nm and the patch edge should be placed just on the hole edge. Opaque defects are repairable by removing them with a laser repair system without any printable damage. A KLA219HRL-PS is used for inspection both before repair and before shipment. It is confirmed that the well repaired (i.e., unprintable) defects are undetectable. Quality assurance tools are summarized.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshifumi Yokoyama, Y. Suzuki, K. Hanzawa, K. Oda, Katsuhide Tsuchiya, Shigeru Noguchi, Minoru Komada, and Hisashi Moro-oka "Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994);

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