New novolak-based positive EB resist, EBR(reg.)-900 M-1

Mutsuo Kataoka; S. Kanetsuki; Kazutaka Tamura; Kyoichi Yamamoto; M. Asano

doi:10.1117/12.191956

3 November 1994 New novolak-based positive EB resist, EBR-900 M-1

Mutsuo Kataoka, S. Kanetsuki, Kazutaka Tamura, Kyoichi Yamamoto, M. Asano

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191956
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

For the fabrication of 64 M and 256 MDRAM reticles, EB resists which have both high resolution and excellent dry etch resistance will be required. It is also particularly important to have high dry etch resistance for the manufacture of phase shift masks. For the development of traditional EB resists, organic solvents are typically used. However from the safety standpoint aqueous developers would be preferred. To meet these requirements a new positive type, aqueous developable EB resist, named EBR_TM-900 M-1, has been developed. EBR_TM-900 M-1 shows resolution down to 0.3 micrometers , good sensitivity, 1.6 - 5 (mu) C/cm² (10 kV) for practical use, excellent dry etch durability same as positive optical resists, and can be developed by aqueous alkaline developers. This resist is not a chemically amplified type and shows excellent post exposure stability and no delay effect. The sensitivity of the coated film does not change in 50 days and the exposed films shows practically no change for up to 7 days in air and 2 days in vacuum. This resist has high sensitivity, not only for E-Beam, but also for argon-ion laser, 363.8 nm. Field data using production EB exposure systems will be presented. The lithographic properties using a CORE- 2564 scanned laser system, are also studied.

Citation Download Citation

Mutsuo Kataoka, S. Kanetsuki, Kazutaka Tamura, Kyoichi Yamamoto, and M. Asano "New novolak-based positive EB resist, EBR-900 M-1", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191956

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available