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3 November 1994 Novel defect inspection method for the LSI mask pattern data
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Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191955
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan
Abstract
It is difficult to inspect the accuracy of LSI mask pattern data processed with a data processing system and to decide whether logical operations and sizing have been performed correctly. We devised a method to inspect mask pattern data for reticle patterns. We compared two sets of mask pattern data, each set processed with a different algorithm. We monitored the system to check the design rules between the layers or for a single. To implement this method, we developed and combined two devices, PAVE and PATACON, and set up the New Conversion and Inspection System of Mask Pattern Data.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Touru Miyauchi, Kenichi Kobayashi, and Kazumasa Shigematsu "Novel defect inspection method for the LSI mask pattern data", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191955
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