Paper
3 November 1994 Phase measurement system with transmitted UV light for phase-shifting mask inspection
Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, Katsuhiro Tsukamoto
Author Affiliations +
Abstract
This paper describes a direct phase measurement system with transmitted UV-light for phase shifting mask (PSM) inspection using a shearing interferometer microscope. Measurements were made with 365 nm monochromatic light of mercury arc lamp. The accuracy of this system is sufficient for the application for phase shifting mask inspection. The measurement results are in good agreement with the calculation based on quartz step height measurement and refractive index. Wafer exposure results of attenuating-type PSM also agree with the phase measurement results.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, and Katsuhiro Tsukamoto "Phase measurement system with transmitted UV light for phase-shifting mask inspection", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191941
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CITATIONS
Cited by 5 scholarly publications and 1 patent.
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KEYWORDS
Phase shifts

Phase measurement

Photomasks

Semiconducting wafers

Quartz

Inspection

Shearing interferometers

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