9 September 1994 Physical characterization methods of selective absorber layers
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Proceedings Volume 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII; (1994) https://doi.org/10.1117/12.185358
Event: Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, 1994, Freiburg, Germany
Abstract
The characterization of primary physical and chemical properties of various thin films prepared by plasma assisted deposition techniques for selective absorber layers is discussed with special emphasis on photoelectron spectroscopy. The materials of interest here consist of an amorphous hydrogenated carbon matrix in which metallic or carbidic clusters are embedded.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Oelhafen, P. Oelhafen, P. Gantenbein, P. Gantenbein, R. Gampp, R. Gampp, } "Physical characterization methods of selective absorber layers", Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); doi: 10.1117/12.185358; https://doi.org/10.1117/12.185358
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